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Semiconductor Silicon Wafer Cutting Products
Semiconductor SiC Wafer Cutting Products
Sunlight Silicon Wafer Cutting Products
Industrial Cleaning Products
Molten Galvanizing Product
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leather Products
Cleaning agent for urethane foam
Hydrogen desulfurized vaporized naphtha
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Company
Product
Introduction of equipment
Customer Service
Seyoung News
Hydrogen desulfurized vaporized naphtha
Company introduction
Organization chart
History
Certificate
the way you come to see
Hydrogen desulfurized vaporized naphtha
Semiconductor Silicon Wafer Cutting Products
Semiconductor SiC Wafer Cutting Products
Sunlight Silicon Wafer Cutting Products
Industrial Cleaning Products
Molten Galvanizing Product
Textile Products
leather Products
Cleaning agent for urethane foam
Hydrogen desulfurized vaporized naphtha
Hydrogen desulfurized vaporized naphtha
Introduction of equipment
Hydrogen desulfurized vaporized naphtha
Inquiries/application
Hydrogen desulfurized vaporized naphtha
Notice
Online Catalog
Reference room
Bulletin Board
Hydrogen desulfurized vaporized naphtha
It contains no benzene, toluene, or xylene, and it does not contain any aromatic solvents.It is a product with a higher printing point and excellent stability.
(1) Clean-1000
(2) Clean-2000
(3) Clean-3000
(4) Clean-4000
(5) Clean-5000
Typical properties
Typical properties
properties
Unit
Specification
Appearance
-
Clear
Specific Gravity
-
0.65 ~ 1.06
Distillation Initial Boiling Point
℃
30 ~ 181
Distillation Final Boiling Point
℃
149 ~ 214
Flash Point TCC
℃
31 ~ None
Packing
- 200L Steel Drum